Title:
FORMATION OF PATTERN ON RESIST LAYER OF GERMANIUM SELENIDE ON SUBSTRATE
Document Type and Number:
Japanese Patent JPS58137835
Kind Code:
A
Abstract:
An improved method of etching a silver-doped germanium selenide resist film utilizing as the etchant gas sulfur hexafluoride.
Inventors:
PAURU GIDEON FUGETSUTO
KURAUSU FURITSUKU
KURAUSU FURITSUKU
Application Number:
JP21913182A
Publication Date:
August 16, 1983
Filing Date:
December 13, 1982
Export Citation:
Assignee:
RCA CORP
International Classes:
G03F7/004; G03C5/56; G03F7/26; G03F7/36; H01L21/027; H01L21/302; H01L21/3065; (IPC1-7): G03C5/00; H01L21/30; H01L21/302
Attorney, Agent or Firm:
Tokunji Ikunuma