Title:
CLEANING DEVICE FOR SEMICONDUCTOR SUBSTRATE
Document Type and Number:
Japanese Patent JPS58168238
Kind Code:
A
Abstract:
PURPOSE:To prevent a substance dissolved in an organic solvent or a solvent from remaining on the surface of a semiconductor substrate by cleaning the substrate with the organic solvent and removing the organic solvent adhered onto the substrate by utilizing a centrifugal force. CONSTITUTION:A plurality of semiconductor substrates 2 are mounted on a substrate supporting tool 3, ethyl alcohol 6 in a container 5 is heated to introduce the vapor into a chamber 1, and the substrate 2 is cleaned with the liquefied ethyl alcohol. A motor 4 is driven to rotate the tool 3 to remove the ethyl alcohol adhered to the substrate by a centrifugal force, valves 10, 11 are opened to introduce clean gas such as nitrogen gas into the chamber 1, and a valve 12 is opened to exhaust the gas in the chamber 1. The cleaned substrate 2 has less remaining ethyl alcohol or remaining substance dissolved in ethyl alcohol on the surface to become extremely clean.
Inventors:
MIKATA HIROICHI
Application Number:
JP5200282A
Publication Date:
October 04, 1983
Filing Date:
March 30, 1982
Export Citation:
Assignee:
TOKYO SHIBAURA ELECTRIC CO
International Classes:
H01L21/304; H01L21/00; (IPC1-7): H01L21/304
Attorney, Agent or Firm:
Takehiko Suzue