Title:
MULTIPLE CHANNEL ELECTRON BEAM ARRAY LITHOGRAPHIC DEVICE
Document Type and Number:
Japanese Patent JPS5825235
Kind Code:
A
Abstract:
A multi-channel electron beam array lithography apparatus comprises parallel operated electron beam channels each of which is of the fly's eye type having an electron gun (13,14A, 14B, 15A, 158) for producing an electron beam, an array lenslet assembly (23), a respective fine deflector assembly (24) and a coarse deflector (11) for selectively directing the electron beam to a desired array lenslet within the array lenslet assembly and its respective fine deflector which thereafter directs the electron beam to a desired point on a target surface. A common movable stage (25) supports the target surface below the electron beam channels and moves the target surface relative to all the electron beam channels. An evacuated housing (12) encloses all of the electron beam channels.
Inventors:
DONARUDO OSUKAA SUMISU
KENESU JIEREMII HAATE
KENESU JIEREMII HAATE
Application Number:
JP8566582A
Publication Date:
February 15, 1983
Filing Date:
May 20, 1982
Export Citation:
Assignee:
CONTROL DATA CORP
International Classes:
H01L21/027; H01J37/30; H01J37/317; (IPC1-7): H01L21/30
Domestic Patent References:
| JPS54160177A | 1979-12-18 | |||
| JPS52109373A | 1977-09-13 | |||
| JPS46247A |
Attorney, Agent or Firm:
Hideto Asamura