PURPOSE: To attain enhanced solubility in a polar solvent or an alkali soln., enhanced resist sensitivity or the like by using a specified bisazido compound as a sensitizer.
CONSTITUTION: A bisazido compound represented by formulaI[where n is 0 or 1; X is -R1-OH, -COOR2, -SiR33, -OR4 or halogen (R1 is lower alkylene; R2 is H or lower alkyl; and each of R3 and R4 is lower alkyl); each of Y and Z is H, -N3, or -SO2N3, when Y is H, Z is -N3 or -SO2N3, and when Z is H, Y is -N3 or -SO2N3], e.g., the compound of formula II or III is used as a sensitizer for a photoresist or a radiation resist. A compound contg. -R1-OH (A) as a substituent X in formulaIhas enhanced solubility in a polar solvent. A compound contg. -COOR2 (B) has enhanced solubility in an alkali soln. A compound contg. -SiR33 (C) results in an increased adhesive property to a semiconductor substrate. A compound contg. -OR4 (D) has enhanced solubility in a polar solvent and enhanced compatibility with a polar polymer. A compound contg. halogen (E) results in increased radiation sensitivity and enhanced resist sensitivity.
SHIYOUJI FUSAJI
OBARA ISAO
TAKEMOTO KAZUNARI
YOKONO ATARU
ISOGAI TOKIO
KOJIMA MITSUMASA
HITACHI CHEMICAL CO LTD