Document Type and Number:
Japanese Patent JPS6123335
Kind Code:
B2
Inventors:
ISHIKAWA TAKASHI
Application Number:
JP4299677A
Publication Date:
June 05, 1986
Filing Date:
April 13, 1977
Export Citation:
Assignee:
ISHIKAWA TAKASHI
International Classes:
E04D1/18; E04D1/34
Previous Patent: A cleaning method of the substrate for the cleaning fluid for semiconductor devices, and semiconduct...
Next Patent: JPS6123336
Next Patent: JPS6123336