Title:
【発明の名称】改良されたシリコンオキシニトリド材料及びその製造方法
Document Type and Number:
Japanese Patent JPS61502616
Kind Code:
A
Abstract:
An improved silicon oxynitride material which is homogeneously chemically bonded and contains minimal free amorphous silicon has improved electrical insulating properties, hardness, scratch resistance, and adhesion. This material is formed on the surface of a selected substrates by a photochemical vapor deposition reaction. First a vapor mixture is formed comprising: ammonia and silane reactants in the ratio of 80:1 or higher; mercury vapors as a sensitizer for the desired photochemical reaction; and a predetermined amount of oxygen. This vapor mixture is introduced into a photochemical vapor deposition chamber containing the selected substrate, and radiation of a predetermined wavelength is simultaneously introduced into the deposition chamber. The selected radiation induces a photochemical reaction between the silane, ammonia, and oxygen to form silicon oxynitride which deposits on the substrate surface. The oxygen reacts with any excess silane to chemically bond and homogeneously incorporate the silicon from the excess silane into the silicon oxynitride material. Thus, the formation of free amorphous silicon from the silane and the heterogeneous incorporation thereof into the silicon oxynitride material are prevented.
Inventors:
Peyers, Jiyoung Davyu
Application Number:
JP50192485A
Publication Date:
November 13, 1986
Filing Date:
April 22, 1985
Export Citation:
Assignee:
Hiyu's Aircraft Company-
International Classes:
C23C16/22; C23C16/30; C23C16/48; H01L21/318; H01L21/314; (IPC1-7): C23C16/30; C23C16/48; H01L21/318
Domestic Patent References:
| JPS4831029A | 1973-04-24 |
Attorney, Agent or Firm:
Takehiko Suzue