Document Type and Number:
Japanese Patent JPS6253946
Kind Code:
B2
Abstract:
This describes a method for electrically evaluating the overlay error of a photolithographic tool. In this process a reusable substrate (10) bearing a fixed reference mark (15) has a photolithographic tool defined metal liftoff pattern (17) formed thereon to provide a pair of conductive lines (20a, 20b) by measuring the relative resistance of the lines with respect to one another the alignment of the tool defined pattern with regard to the reference mark (15) may be determined and thus the overlay error of the tool established.
Inventors:
ARUBAATO SUCHIIBUN BAAGENDOORU
Application Number:
JP14355082A
Publication Date:
November 12, 1987
Filing Date:
August 20, 1982
Export Citation:
Assignee:
INTAANASHONARU BIJINESU MASHIINZU CORP
International Classes:
H01L21/68; G03F7/20; H01L21/027; H01L21/66; H01L23/544
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