Document Type and Number:
Japanese Patent JPS629976
Kind Code:
B2
Abstract:
The microwave plasma source of this invention comprises a vacuum room which forms a discharging space with discharge gas introduced therein, a means for conducting the microwave to the discharging space so that the microwave electric field is provided in the discharging space, and a means for providing the magnetic field in the discharging space located on the microwave propagating path and made up of a permanent magnet which virtually propagates the microwave.
Inventors:
NISHIMATSU SHIGERU
SUZUKI KEIZO
SAKUMICHI KUNYUKI
NINOMYA TAKESHI
KOIKE HIDEMI
OKADA OSAMI
KATAGIRI SHINJIRO
OKUDAIRA SADAYUKI
SUZUKI KEIZO
SAKUMICHI KUNYUKI
NINOMYA TAKESHI
KOIKE HIDEMI
OKADA OSAMI
KATAGIRI SHINJIRO
OKUDAIRA SADAYUKI
Application Number:
JP15830080A
Publication Date:
March 03, 1987
Filing Date:
November 12, 1980
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01J25/50; H01J27/16; H01J37/08; H01J37/317; H01J37/32; H01L21/265; H01L21/302; H01L21/3065; H05H1/46
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