Title:
フォトレジスト用高分子及びフォトレジスト用樹脂組成物
Document Type and Number:
Japanese Patent JPWO2002048217
Kind Code:
A
Inventors:
Keizo Inoue
堤 聖晴
Katsunori Funaki
Tomoko Adachi
堤 聖晴
Katsunori Funaki
Tomoko Adachi
Application Number:
JP2001010832W
Publication Date:
June 20, 2002
Filing Date:
December 11, 2001
Export Citation:
Assignee:
Daicel Chemical Industries, Ltd.
International Classes:
(IPC1-7): C08F220/28; C07D307/77; G03F7/039
Attorney, Agent or Firm:
Yukihisa Goto
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