Title:
膜形成用組成物、及び積層体の製造方法
Document Type and Number:
Japanese Patent JPWO2017217474
Kind Code:
A1
Abstract:
下記式(1)で表されるシロキサン化合物の加水分解物と、シリカ粒子と、ケトン系溶剤と、水と、を含む膜形成用組成物、及び積層体の製造方法。式(1)中、R1、R2、R3、及びR4は、それぞれ独立に、炭素数1〜6の1価の有機基を表す。nは、2〜20の整数を表す。
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Inventors:
Takeshi Hama
Yusuke Hatanaka
Naoki Koito
Nakamichi Aki
Yusuke Hatanaka
Naoki Koito
Nakamichi Aki
Application Number:
JP2018523978A
Publication Date:
February 14, 2019
Filing Date:
June 14, 2017
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
C09D183/02; B32B27/00; B32B27/18; C09D7/20; C09D7/61; C09D7/63; C09D133/00; C09D175/04
Domestic Patent References:
JP2010144009A | 2010-07-01 |
Foreign References:
WO2016056489A1 | 2016-04-14 | |||
WO2015012021A1 | 2015-01-29 | |||
WO2015141240A1 | 2015-09-24 | |||
WO2015122395A1 | 2015-08-20 | |||
WO2009025247A1 | 2009-02-26 |
Attorney, Agent or Firm:
Patent Service Corporation Taiyo International Patent Office