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Title:
膜形成用組成物、及び積層体の製造方法
Document Type and Number:
Japanese Patent JPWO2017217474
Kind Code:
A1
Abstract:
下記式(1)で表されるシロキサン化合物の加水分解物と、シリカ粒子と、ケトン系溶剤と、水と、を含む膜形成用組成物、及び積層体の製造方法。式(1)中、R1、R2、R3、及びR4は、それぞれ独立に、炭素数1〜6の1価の有機基を表す。nは、2〜20の整数を表す。

Inventors:
Takeshi Hama
Yusuke Hatanaka
Naoki Koito
Nakamichi Aki
Application Number:
JP2018523978A
Publication Date:
February 14, 2019
Filing Date:
June 14, 2017
Export Citation:
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Assignee:
FUJIFILM Corporation
International Classes:
C09D183/02; B32B27/00; B32B27/18; C09D7/20; C09D7/61; C09D7/63; C09D133/00; C09D175/04
Domestic Patent References:
JP2010144009A2010-07-01
Foreign References:
WO2016056489A12016-04-14
WO2015012021A12015-01-29
WO2015141240A12015-09-24
WO2015122395A12015-08-20
WO2009025247A12009-02-26
Attorney, Agent or Firm:
Patent Service Corporation Taiyo International Patent Office