Document Type and Number:
Japanese Patent JPWO2022102458
Kind Code:
A1
Abstract:
This development processing device for performing development processing on a substrate comprises a holding/rotating unit which holds and rotates the substrate, a developer supply unit which supplies a developer to the substrate held by the holding/rotating unit, a gas supply unit which supplies inert gas to the substrate held by the holding/rotating unit, and a control unit, wherein the control unit controls the holding/rotating unit, the developer supply unit, and the gas supply unit so as to execute: a step (S1) for developing a resist film on the substrate with the developer; a step (S3) for rotating and drying the substrate after the step for developing; a step (S2), after the step for developing and before the step for drying, for rotating the substrate and supplying inert gas to a center region of the substrate, and holding a developer liquid film in the center region while discharging dissolution products from the center region.
Application Number:
JP2022561835A
Publication Date:
May 19, 2022
Filing Date:
November 01, 2021
Export Citation:
