Document Type and Number:
Japanese Patent JPWO2023037545
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide an ion beam device that can sharpen an emitter tip to the atomic level with good reproducibility and while curbing device downtime. The ion beam device according to the present invention carries out measurement of a helium ion beam current and, depending on the result of this measurement, switches between a first process of adjusting a nitrogen gas or oxygen gas flow rate, and a second process of adjusting an extraction voltage (refer to Fig. 5).
Application Number:
JP2023546712A
Publication Date:
March 16, 2023
Filing Date:
September 13, 2021
Export Citation:
