Title:
1, 2-NAPHTHOQUINONE-2-DIAZIDOSULFONIC ACID ESTER CONTAINING PERFLUOROALKYL GROUP AND PHOTOSENSITIVE COPYING MATERIAL CONTAINING THE SAME
Document Type and Number:
Japanese Patent JPS6123149
Kind Code:
A
Abstract:
Light-sensitive perfluoroalkyl group-containing 1,2-naphthoquinone diazide compounds and reproduction materials comprising a support and a light-sensitive layer containing such compounds useful in producing planographic printing plates for waterless printing. The 1,2-naphthoquinone diazide compounds correspond to the formula I. (I) wherein Ar denotes a mononuclear to trinuclear aromatic radical D is a 1,2-naphthoquinone-2-diazide-4-sulfonyl radical or a 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, RF is a perfluoroalkyl radical having from 5 to 15 carbon atoms, W is a single bond or is selected from the group consisting of -(CH2)mCOO -(CH2)mOOCCHR2O -(CH2)mOCoH2oCOO -(CH2)mOOC -(CH2)mOOCCoH2oCOO -(CH2)mSO2NH -(CH2)mOOCCHCHCOO -C6H4SO2NH -(CH2)mCO -(CH2)mCONH -(CH2)mSO3 -(CH2)mOOCCoH2oCONH -C6H4SO3 -(CH2)mOOCCHCHCONH, - R1 is hydrogen, halogen, an alkyl or alkoxy group having from 1 to 5 carbon atoms, an acetyl or a propionyl, R2 is an alkyl group having from 1 to 12 carbon atoms, m is 0 or a number from 1 to 6, n is a number from 1 to 3, o is a number from 1 to 12, and p is a number from 1 to 3.
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Inventors:
BUERUNAA HAA MIYURAA
Application Number:
JP12288285A
Publication Date:
January 31, 1986
Filing Date:
June 07, 1985
Export Citation:
Assignee:
HOECHST AG
International Classes:
G03C1/72; C07C67/00; C07C301/00; C07C309/72; C07C311/21; G03F7/004; G03F7/022; (IPC1-7): C07C143/68; C07C143/78; G03C1/72; G03F7/08
Attorney, Agent or Firm:
Toshio Yano