Title:
1,1,1-TRIS@(3754/24)HYDROXYCYCLOHEXYL)METHANES, COMPOSITION CONTAINING THE COMPOUND AS MAIN COMPONENT AND THEIR PRODUCTION
Document Type and Number:
Japanese Patent JP3283314
Kind Code:
B2
Abstract:
PURPOSE: To provide the subject new compound useful as a photoresist material, its raw material, production raw material for various polymeric materials, additive, its production raw material, additive for improving performance of various oily products and its production raw material.
CONSTITUTION: The 1,1,1-tris(hydroxycyclohexyl)methanes of formula I (R1 to R4, R5 to R8 and R9 to R12 are H, halogen, OH, lower alkyl, halogenated lower alkyl, alkoxy or cycloalkyl), e.g. 1,1,1-tris(4-hydroxycyclohexyl)methane. The compound of formula I can be produced by completely hydrogenating the nuclei of a trisphenolic compound of formula II. The compound of formula I enables high-sensitivity photolithography even with short wavelength ray. It is also useful as an additive for improving the properties of various oily products, its production raw material, organic peroxide, etc., production raw material for various organic compound products, etc.
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Inventors:
Tadashi Hiramine
Toru Masuda
Toru Masuda
Application Number:
JP196293A
Publication Date:
May 20, 2002
Filing Date:
January 08, 1993
Export Citation:
Assignee:
Honshu Chemical Industry Co., Ltd.
International Classes:
B01J25/02; C07B61/00; C07C29/19; C07C35/21; (IPC1-7): C07C35/21; B01J25/02; C07C29/19
Domestic Patent References:
| JP62281832A | ||||
| JP63168431A |
Attorney, Agent or Firm:
Itsuro Makino
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