NEW MATERIAL:The compound of formulaI[R1, R2, R3, R4, R5 and R6 are H, alkyl, sulfonic acid group, carboxylic acid group or its derivative; X is an anion group (Lewis acid salt) such as BF-4, PF-6, AsF-6, SbF-6, SnCl-26, FeCl-4, BiCl-25, etc. which generates a Lewis acid by light irradiation].
EXAMPLE: 2-Naphthol-1-diazonium boron tetrafluoride.
USE: Raw material for the preparation of photo-sensitive resin.
PROCESS: The compound of formulaIcan be prepared by (1) reacting aminonaphthol of formula II, or an aminonaphthol salt derived from said aminonaphthol and hydrochloric acid or the above Lewis acid salt, with sodium nitrite or an alkyl nitrite, and (2) reacting the product with a Lewis acid and a compound composed of the complex of the acid and its salt (e.g. fluoboric acid or its K or Na salt).
NUMAKURA TAKASHI
OKAMOTO KUNIO
TSUKADA NORIAKI
HARASHIMA SUSUMU
| JPS4963423A | 1974-06-19 |