To provide an excimer laser which can generate a high-quality pulsed laser beam at a pulse rate of about 4,000 Hz with pulse energy of about ≥5 mJ.
The excimer laser can generate a high-quality pulsed laser beam at a pulse rate of about 4,000 Hz with pulse energy of about ≥5 mJ. In an appropriate embodiment, an ArF excimer laser which is designed specifically to a light source used for integrated circuit lithography is disclosed. An improved wavemeter provided with special software maintains the wavelength and pulse energy of the laser beam within prescribed limits by controlling a high-speed PZT driving tuning mirror and a pulse power charging voltage. In a certain ideal embodiment, discharge dust is eliminated from a discharge area within the period of about 0.25 millisecond between pulses by generating a sufficient gas flow by driving a single cross flow fan by means of two fan motors.
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DUFFEY THOMAS P
PARTLO WILLIAM N
SANDSTROM RICHARD L
MELCHER PAUL C
JOHNS DAVID M
SAETHRE ROBERT B
FLEUROV VLADIMIR B
NESS RICHARD M
RETTIG CURTIS L
SHANNON ROBERT A
UJAZDOWSKI RICHARD C
ROKNI SHAHRYAR
PAN XIAOJIANG J
KULGEYKO VLADIMIR
SMITH SCOTT T
ANDERSON STUART L
ALGOTS JOHN M
SPANGLER RONALD L
FOMENKOV IGOR V
