Title:
【発明の名称】AF4合成
Document Type and Number:
Japanese Patent JP2001515507
Kind Code:
A
Abstract:
Methods of making parylene AF4 using novel that result in reduced cost. Low dilution technology may used to provide parylene AF4 in substantially improved yields. The relative amount of transition metal catalyst can be decreased. The amount of undesired byproduct is also reduced.
Inventors:
Dolvia, William Earl, Junior
Duane, Gian Jin
Roche, Alex Jay
Duane, Gian Jin
Roche, Alex Jay
Application Number:
JP54051598A
Publication Date:
September 18, 2001
Filing Date:
February 25, 1998
Export Citation:
Assignee:
Specialty Coating Systems, Inc.
International Classes:
C07B61/00; C07C17/14; C07C17/269; C07C23/18; (IPC1-7): C07C17/269; C07C23/18
Domestic Patent References:
| JPH05255149A | 1993-10-05 |
Attorney, Agent or Firm:
Kazuo Shamoto (5 outside)