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Patent Searching and Data


Title:
収差補正方法、この収差補正方法を用いたレーザ加工方法、この収差補正方法を用いたレーザ照射方法、収差補正装置、及び、収差補正プログラム
Document Type and Number:
Japanese Patent JP5692969
Kind Code:
B2
Abstract:
In an aberration-correcting method according to an embodiment of the present invention, in an aberration-correcting method for a laser irradiation device 1 which focuses a laser beam on the inside of a transparent medium 60, aberration of a laser beam is corrected so that a focal point of the laser beam is positioned within a range of aberration occurring inside the medium. This aberration range is not less than n×d and not more than n×d+”s from an incidence plane of the medium 60, provided that the refractive index of the medium 60 is defined as n, a depth from an incidence plane of the medium 60 to the focus of the lens 50 is defined as d, and aberration caused by the medium 60 is defined as ”s.

Inventors:
Haruyasu Ito
Naoya Matsumoto
Taku Inoue
Application Number:
JP2009125759A
Publication Date:
April 01, 2015
Filing Date:
May 25, 2009
Export Citation:
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Assignee:
Hamamatsu Photonics Co., Ltd.
International Classes:
G02F1/01; B23K26/046; B23K26/064; G02B13/00
Domestic Patent References:
JP2005224841A
Foreign References:
WO2003036368A1
Other References:
井上 卓,波面制御素子としての液晶空間光変調器と補償光学,光技術コンタクト,2007年 5月20日,第45巻,第5号,251-257頁
久保田 広,光学,岩波書店,1971年 6月30日,128-130頁,300-301頁
Attorney, Agent or Firm:
Yoshiki Hasegawa
Shiro Terasaki
Satoru Ishida