Title:
ABRASIVE CLOTH, POLISHING DEVICE AND STICKING METHOD FOR ABRASIVE CLOTH
Document Type and Number:
Japanese Patent JP2004090106
Kind Code:
A
Abstract:
To position abrasive cloth with high accuracy while reducing the load of sticking work.
Protective films 2a to 2c on a pressure sensitive adhesive layer 2b are divided into three parts along slits 13a, 13b, notches 14a, 14b taken as an index for positioning are provided, and guide patterns 22a, 22b taken as an index for positioning abrasive cloth 2 are provided on the surface of a polishing table 1.
Inventors:
HIROZAWA MINORU
Application Number:
JP2002251300A
Publication Date:
March 25, 2004
Filing Date:
August 29, 2002
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
B24B49/04; B24B37/013; B24B37/20; B24B37/24; H01L21/304; (IPC1-7): B24B37/00; B24B37/04; B24B49/04; H01L21/304
Attorney, Agent or Firm:
Masahiko Ueyanagi
Fujitsuna Hideyoshi
Osamu Suzawa
Fujitsuna Hideyoshi
Osamu Suzawa