Title:
磁気ディスク基板用研磨剤組成物
Document Type and Number:
Japanese Patent JP7219097
Kind Code:
B2
Abstract:
To provide a polishing agent composition for a magnetic disk substrate, which achieves not only reduction of short-wavelength waviness of the substrate after polishing but also reduction of halation, without lowering productivity.SOLUTION: A polishing agent composition contains colloidal silica, a water-soluble polymer compound, and water. The water-soluble polymer compound is a copolymer having a monomer having a carboxylic acid group and a monomer having a sulfonic acid group as essential monomers, and a molar ratio of a constitutional unit derived from the monomer having the carboxylic acid group to the constitutional unit derived from the monomer having the sulfonic acid group is in a range of 95:5 to 5:95. The water-soluble polymer compound has a weight average molecular weight of 1,000 to 1,000,000.SELECTED DRAWING: None
Inventors:
Junichiro Ando
Application Number:
JP2019008288A
Publication Date:
February 07, 2023
Filing Date:
January 22, 2019
Export Citation:
Assignee:
Yamaguchi Seiken Industry Co., Ltd.
International Classes:
G11B5/84; B24B37/00; C09K3/14; H01L21/304
Domestic Patent References:
| JP2019008846A | ||||
| JP2012198976A | ||||
| JP2010135052A |
Attorney, Agent or Firm:
Ippei Watanabe
Koike Shigeru
Yoshio Nagaoka
Koike Shigeru
Yoshio Nagaoka