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Title:
ABRASIVE COMPOSITION, METHOD FOR PRODUCING ABRASIVE COMPOSITION AND POLISHING METHOD
Document Type and Number:
Japanese Patent JP2002038131
Kind Code:
A
Abstract:

To provide a slurry abrasive composition free from the problems of the coagulation and precipitation during the long-term storage and the discoloration caused by the photo-decomposition reaction of chemicals added to the slurry and having excellent long-term storage stability.

The abrasive composition contains cocoon-shaped silica particles and crystalline silica particles. Especially, at least a part of the cocoon-shaped silica particles are integrated with at least a part of the crystalline silica particles to form a composite abrasive material.


Inventors:
SHIMAMOTO IWAI
ICHIKAWA SHOJI
KONDO KATSUMI
ABE SAN
TAKENOUCHI KENJI
Application Number:
JP2000219901A
Publication Date:
February 06, 2002
Filing Date:
July 19, 2000
Export Citation:
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Assignee:
RODEL NITTA CO
ADMATECHS CO LTD
International Classes:
B01D61/14; B01D63/02; B24B37/00; C09G1/02; C09K3/14; H01L21/304; (IPC1-7): C09K3/14; B01D61/14; B01D63/02; B24B37/00; H01L21/304
Attorney, Agent or Firm:
Shusaku Yamamoto