Title:
シリカ系複合微粒子分散液、その製造方法及びシリカ系複合微粒子分散液を含む研磨用砥粒分散液
Document Type and Number:
Japanese Patent JP6648064
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a production method for a silica-based composite particle fluid dispersion capable of polishing even a silica film, a Si wafer or a difficult-to-work material at high speed and achieving high surface accuracy at same time.SOLUTION: There is provided the silica-based composite fine particle fluid dispersion including silica-based composite fine particle which has an average particle diameter of 50 to 350 nm and has, on a surface of a mother particle having amorphous silica as main component, a child particle having crystalline ceria as a main component, and comprises properties of following [1] to [4]. [1] The silica-based composite fine particle has a mass ratio of silica and ceria of 100:11 to 316. [2] Only a crystal phase of ceria is detected when the silica-based composite fine particles are subjected to an X ray diffraction. [3] The silica-based composite fine particle has crystallite diameter of the crystalline ceria measured by the X ray diffraction of 10 to 25 nm. [4] A silicon atom is solid-solved in the crystalline ceria which is a main component of the child particles.SELECTED DRAWING: Figure 1
More Like This:
Inventors:
Yuji Tawara
Komatsudori
Shinya Usuda
Kazuhiro Nakayama
Komatsudori
Shinya Usuda
Kazuhiro Nakayama
Application Number:
JP2017083208A
Publication Date:
February 14, 2020
Filing Date:
April 19, 2017
Export Citation:
Assignee:
JGC Catalysts Co., Ltd.
International Classes:
C01B33/149; C09G1/02; C09K3/14; H01L21/304
Domestic Patent References:
| JP9132770A | ||||
| JP2007061989A | ||||
| JP2015231029A | ||||
| JP2015199652A |
Foreign References:
| WO2005035688A1 | ||||
| US5766279 |
Attorney, Agent or Firm:
Shunsuke Umeda
Takahashi politics
Takahashi politics