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Title:
ABRASIVE MATERIAL AND ITS MANUFACTURE
Document Type and Number:
Japanese Patent JPH05177554
Kind Code:
A
Abstract:

PURPOSE: To provide a polish, which can perform polishing operations with good preciseness and which is favorable as material to final stage of finishing process for the work to be polished-in particular, a work requiring precision polishing-and to establish a method of manufacturing such polish.

CONSTITUTION: A polish is equipped with a flexible support and a polishing layer containing abrasive grains formed on the support, wherein the abrasive grains in the polishing layer are made of globular alumina having particle sizes between 1-10μm and that the max. and min. particle sizes (x), (y) in the globular alumina are related so that (y)/(x)≥0.7, and a method is provided for manufacturing such polish.


Inventors:
IWASAKI AKIRA
SUZUURA YASUKI
Application Number:
JP35771491A
Publication Date:
July 20, 1993
Filing Date:
December 26, 1991
Export Citation:
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Assignee:
DAINIPPON PRINTING CO LTD
INK TEC KK
International Classes:
B24D3/00; B24D11/00; (IPC1-7): B24D3/00; B24D11/00
Attorney, Agent or Firm:
Kiyoshi Arai



 
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