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Patent Searching and Data


Title:
ABRASIVE MATERIAL AND MANUFACTURE THEREOF
Document Type and Number:
Japanese Patent JPS6268278
Kind Code:
A
Abstract:

PURPOSE: To make possible to carry out precise fabrication, by covering the outer surface of a base member with a thin film including at least crystal grain to prevent the latter from coming off.

CONSTITUTION: A buffer layer 11 is formed by sputtering a carbon target with the use of an argon beam or the like emitted from an ion beam source in the atmosphere of hydrogen. Thereafter, hydrogen gas of about, for example, 20% is mixed into argon, to form a carbon film 13 including diamond grain 12 having a particle size of about 1μm on a base member 4 arranged in parallel with the ion beam. Since the diamond grain 12 is mixed in the film 13, it is possible to prevent the diamond particle 12 from coming off, and since no abrasive power dust is embedded into the outer surface of the base member, it is possible to carry out fabrication with a high degree of accuracy.


Inventors:
HIROCHI KUMIKO
KITAHATA MAKOTO
YAMAZAKI OSAMU
Application Number:
JP20683285A
Publication Date:
March 28, 1987
Filing Date:
September 19, 1985
Export Citation:
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Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
B24D3/00; C09K3/14; (IPC1-7): B24D3/00; C09K3/14
Attorney, Agent or Firm:
Toshio Nakao