Title:
アセタールの選択的脱保護法
Document Type and Number:
Japanese Patent JP4729752
Kind Code:
B2
Abstract:
To provide a method for selective deprotection of an acetal originated from aldehyde under a mild condition.
The invention relates to the method for deprotection of acetal comprising conversion of acetal group originated from aldehyde group to the aldehyde group by sequentially adding an organic base and TMSOTf (Trimethylsilyl Trifluoromethanesulfonate) or TESOTf (Triethylsilyl Trifluoromethanesulfonate) to a compound having acetal group originated from aldehyde group in methylene chloride at 0°C.
COPYRIGHT: (C)2006,JPO&NCIPI
Inventors:
Yasuyuki Kita
Hiromichi Fujioka
Yoshinari Sawama
Hiromichi Fujioka
Yoshinari Sawama
Application Number:
JP2004196870A
Publication Date:
July 20, 2011
Filing Date:
July 02, 2004
Export Citation:
Assignee:
National University Corporation Osaka University
Chemical Soft Development Laboratory Co., Ltd.
Chemical Soft Development Laboratory Co., Ltd.
International Classes:
C07C45/52; C07C47/02; C07C47/11; C07C47/198; C07C47/228; C07C49/04; C07C67/297; C07C69/14; C07D317/26; C07D317/72; C07F7/18; C07J21/00; C07B61/00; C07J9/00
Domestic Patent References:
| JP62096438A | ||||
| JP63093796A | ||||
| JP2003267930A |
Attorney, Agent or Firm:
Kyoto International Patent Office
Ryouhei Kobayashi
Ryouhei Kobayashi