ACID-CLEAVABLE COMPOUND, POSITIVE TYPE RADIATION-SENSITIVE MIXTURE CONTAINING THE SAME, AND RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED WITH THE SAID MIXTURE

Title:

ACID-CLEAVABLE COMPOUND, POSITIVE TYPE RADIATION-SENSITIVE MIXTURE CONTAINING THE SAME, AND RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED WITH THE SAID MIXTURE

Document Type and Number:

Japanese Patent JPH05194357

Kind Code:

A

Abstract:

PURPOSE: To provide the new compounds useful as radiation-sensitive recording materials showing a high resolution and high image contrast.

CONSTITUTION: The compounds of the formula (R1 is an alkylene, cycloalkylene, alkenylene, etc.; R2 is an alkyl, alkenyl, cycloalkyl, aryl, etc.; R3 is an alkyl, aryl; X is -CO-, -O-CO-, -NH-CO-; (n) ≥2, particularly 3 to 50) are obtained, for example, by reacting benzaldehyde dimethylacetal with urethane-alcohol in toluene in the presence of p-toluenesufonic acid. The compounds are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive type mixtures, which are used particularly for recording materials for UV radiation and high energy radiation.

Inventors:

GEORUKU PAUROSUKII
HORUSUTO RESHIERUTO
WARUTAA SHIYUPIISU
RARUFU DAMERU

Application Number:

JP12407792A

Publication Date:

August 03, 1993

Filing Date:

April 17, 1992

Export Citation:

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Assignee:

HOECHST AG

International Classes:

C09K11/00; C07C235/00; C07C235/08; C07C271/12; C07C271/14; C07C271/16; C07C275/04; C07C275/06; C07C275/24; C07C275/28; C07C323/10; C07D317/54; C08G69/00; C08G71/00; G01D15/14; G03F7/004; G03F7/039; (IPC1-7): C07C235/08; C07C271/16; C07C275/04; C07C275/28; C07C323/10; C09K11/00; G01D15/14

Attorney, Agent or Firm:

Kazuo Sato (2 outside)

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