Title:
ACID GENERATOR FOR CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION, METHOD FOR PRODUCING THE ACID GENERATOR, AND THE CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2010053121
Kind Code:
A
Abstract:
To provide an acid generator giving a chemically amplified photoresist composition forming good patterns and exhibiting high resolution.
The acid generator is a compound represented by formula (I), wherein R1 is a 1-20C aliphatic hydrocarbon group, a 5-10C aryl group or the like; W1 is -CO-O-, -O-CO-, -CH2-O-, -O-CH2- or the like; Q1 and Q2 are each H, F, 1-6C alkyl or the like; A is a group of formula (I-1); and A1 is -CH2-CH2-, -CH2-CH2-CH2-, -CH=CH- or -CH=CH-CH2-.
Inventors:
TAKEMOTO KAZUKI
MASUYAMA TATSURO
HIRAOKA TAKASHI
MASUYAMA TATSURO
HIRAOKA TAKASHI
Application Number:
JP2009172871A
Publication Date:
March 11, 2010
Filing Date:
July 24, 2009
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07D207/46; C07D209/76; C07D217/24; C07D221/14; C07D405/12; C08F20/38; C09K3/00; G03F7/004; G03F7/039; H01L21/027; C07B61/00
Domestic Patent References:
| JP2007072214A | 2007-03-22 | |||
| JP2007145797A | 2007-06-14 | |||
| JPH05127392A | 1993-05-25 | |||
| JPH08194341A | 1996-07-30 | |||
| JPS55118030A | 1980-09-10 | |||
| JP2004240170A | 2004-08-26 | |||
| JP2002107920A | 2002-04-10 |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto