Title:
ACID-UNSTABLE PHOTOCHEMICALLY ACTIVE COMPOSITION
Document Type and Number:
Japanese Patent JPH09185165
Kind Code:
A
Abstract:
To prevent the formation of a granular body in a positive type photoresist compsn. contg. an alkali-soluble polymer and a photochemically active compd.
This compsn. is a photoresist coating compsn. contg. an alkali- soluble resin and a photochemically active compd. dissolved in a solvent. The photochemically active compd. is polyhydric alcohol having a 1st hydroxyl group esterified with an o-quinonediazidosulfonic acid halide and a 2nd hydroxyl group protected with a protective group which is an acid-unstable group and is released by contact with an acid to convert the protected hydroxyl group into a free hydroxyl group.
Inventors:
ROJIYAA EFU SHINTA
DANIERU WAI PAI
TEIMOSHII JII ADAMUSU
DANIERU WAI PAI
TEIMOSHII JII ADAMUSU
Application Number:
JP25626696A
Publication Date:
July 15, 1997
Filing Date:
September 27, 1996
Export Citation:
Assignee:
SHIPLEY CO
International Classes:
G03F7/004; C09D7/12; G03F7/022; G03F7/033; G03F7/039; H01L21/027; H05K3/06; (IPC1-7): G03F7/022; C09D7/12; G03F7/004; G03F7/033; G03F7/039; H01L21/027; H05K3/06
Attorney, Agent or Firm:
Hajime Tsukuni (2 outside)