To provide a novel acrylic acid ester derivative that can become a structural unit of a polymer compound to be contained by a photoresist composition, and to provide a method for manufacturing the same.
The acrylic acid ester derivative is shown by general formula (1). In the formula, R1 denotes a hydrogen atom, an alkyl group or a halogenated alkyl group; W denotes a divalent linking group; X denotes a 1-5C alkylene group that may contain an oxygen atom or a sulfur atom, an oxygen atom or a sulfur atom; R2 denotes an alkyl group, an alkoxy group, a halogenated alkyl group, a hydroxyl group, -COOR'', -OC(=O)R'' or a cyano group; R'' denotes a hydrogen atom or an alkyl group; v1 denotes an integer of 0 to 3; and R3 denotes a hydrogen atom or an alkyl group that may contain an oxygen atom at an arbitrary position.
FUKUMOTO TAKASHI
NAKAYAMA OSAMU
