Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び、電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP7280957
Kind Code:
B2
Abstract:
Provided are an actinic ray-sensitive or radiation-sensitive resin composition capable of forming an actinic ray-sensitive or radiation-sensitive film having an excellent adhesiveness (in particular, adhesiveness in a dry state) to a substrate while suppressing a sensitivity reduction; and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin having a polarity that increases by an action of an acid, (B) a photoacid generator, (P) an amine oxide, and (D) an acid diffusion control agent (provided that acid diffusion control agents corresponding to the amine oxide are excluded), in which a content of the amine oxide (P) is from 0.01 ppm to 1,000 ppm with respect to a total mass of the actinic ray-sensitive or radiation-sensitive resin composition, and a mass ratio of the acid diffusion control agent (D) to the amine oxide (P) is more than 1 and 10,000 or less.

Inventors:
Naoya Hatakeyama
Yasutomo Yonekuda
Keimitsu Tomiga
Kohei Higashi
Fumihiro Yoshino
Application Number:
JP2021542713A
Publication Date:
May 24, 2023
Filing Date:
August 12, 2020
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Fujifilm Corporation
International Classes:
G03F7/004; G03F7/038; G03F7/039; G03F7/20
Foreign References:
WO2017115629A1
Attorney, Agent or Firm:
Patent Attorney Corporation Koei Office