Title:
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2011209520
Kind Code:
A
Abstract:
To provide an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in development defect performance, liquid immersion defect performance and limit resolution and enables to form a pattern having a good shape, and a pattern forming method using the same.
The actinic ray-sensitive or radiation-sensitive resin composition comprises a resin which contains a first repeating unit having a group that is decomposed by the action of an acid to thereby generate an alcoholic hydroxyl group, and which exhibits decreased solubility in a developer containing an organic solvent under the action of an acid, a compound which generates an acid upon irradiation with actinic rays or radiation, and a hydrophobic resin.
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Inventors:
IWATO KAORU
KATAOKA SHOHEI
TARUYA SHINJI
KAMIMURA SATOSHI
ENOMOTO YUICHIRO
FUJII KANA
KATO KEITA
DOBASHI TORU
MIZUTANI KAZUYOSHI
KATAOKA SHOHEI
TARUYA SHINJI
KAMIMURA SATOSHI
ENOMOTO YUICHIRO
FUJII KANA
KATO KEITA
DOBASHI TORU
MIZUTANI KAZUYOSHI
Application Number:
JP2010077432A
Publication Date:
October 20, 2011
Filing Date:
March 30, 2010
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
G03F7/038; C08F20/36; C08F32/04; G03F7/32; H01L21/027
Domestic Patent References:
| JP2008309879A | 2008-12-25 | |||
| JP2011221513A | 2011-11-04 | |||
| JP2010128376A | 2010-06-10 | |||
| JP2009025707A | 2009-02-05 | |||
| JP2008134607A | 2008-06-12 | |||
| JP2009199021A | 2009-09-03 | |||
| JP2009075430A | 2009-04-09 | |||
| JP2006251761A | 2006-09-21 | |||
| JP2010113319A | 2010-05-20 | |||
| JP2011219742A | 2011-11-04 | |||
| JP2010001461A | 2010-01-07 | |||
| JP2009025708A | 2009-02-05 | |||
| JP2008203639A | 2008-09-04 |
Foreign References:
| WO2009142181A1 | 2009-11-26 |
Attorney, Agent or Firm:
Kurata Masatoshi
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Katsumura Hiro
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
Takuzo Ichihara
Yamashita Gen
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Katsumura Hiro
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
Takuzo Ichihara
Yamashita Gen