ACTINIC RAY SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN USING THE SAME

Japanese Patent JP2012022100

A

To provide an actinic ray sensitive or radiation sensitive resin composition that can satisfy both excellent developing property and excellent followability of immersion liquid and to provide a method for forming pattern using the composition.

An actinic ray sensitive or radiation sensitive resin composition according to the present invention is a resin (B) having at least one of fluorine atom and silicon atom and includes a resin (B) including a repeating unit expressed by the following formula (I); a resin (A) whose solubility in an alkali developing solution is increased by an action of an acid; and a compound which generates an acid upon irradiation with actinic ray or radiation.

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IIZUKA YUSUKE
SHIBUYA AKINORI
TAKAHASHI HIDETOMO
FUKUHARA TOSHIAKI
KOSHIJIMA KOSUKE

JP2010159093A

February 02, 2012

July 13, 2010

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FUJIFILM CORP

G03F7/039; C08F12/04; C08F22/12; C08F22/36; G03F7/004; G03F7/38; H01L21/027

JP2010085971A	2010-04-15
JP2009145714A	2009-07-02
JP2006234938A	2006-09-07
JP2007326903A	2007-12-20
JP2008257166A	2008-10-23
JP2010033031A	2010-02-12

WO2009057484A1

2009-05-07

Kurata Masatoshi
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Katsumura Hiro
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
Takuzo Ichihara
Yamashita Gen

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