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Patent Searching and Data


Title:
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE
Document Type and Number:
Japanese Patent JP2015169838
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an actinic-ray-sensitive or radiation-sensitive resin composition having a large focus latitude and suppressing pattern collapse even when a fine pattern is formed, and a pattern formation method, an electronic device manufacturing method, and an electronic device using the composition.SOLUTION: This actinic-ray-sensitive or radiation-sensitive resin composition contains a resin (P) including recurring units (i) having a radical that is decomposed by the action of an acid represented by general formula (1).

Inventors:
GOTO AKIYOSHI
KOJIMA MASASHI
SHIRAKAWA MICHIHIRO
KATO KEITA
O KEIYU
Application Number:
JP2014045583A
Publication Date:
September 28, 2015
Filing Date:
March 07, 2014
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
G03F7/038; C08F22/10; G03F7/039; H01L21/027
Domestic Patent References:
JP2014028926A2014-02-13
JP2014198698A2014-10-23
JP2014170167A2014-09-18
JP2014145809A2014-08-14
JP2012008526A2012-01-12
Foreign References:
WO2012036250A12012-03-22
Attorney, Agent or Firm:
渡辺 望稔
三和 晴子
伊東 秀明
三橋 史生