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Patent Searching and Data


Title:
ACTIVE ENERGY RAY-CURABLE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP2000053735
Kind Code:
A
Abstract:

To obtain the subject composition capable of forming a coating film having excellent wear resistance and fogging resistance when irradiated with an active energy ray by including a polyglycerol derivative having a specific structure.

This composition comprises a polyglycerol derivative having a structure of formula I {R1 is a group of formula II or formula III [X is (meth) acrylate or (meth)acrylate terminal acyloxy]; R2 and R3 are each H or a group of formula II or formula III), containing a hydroxyl group in the molecule in which ≥50% of the main change end and the side chain end are (meth) acrylate groups and the rest is an epoxy group in the composition. Preferably the composition contains a reactive surfactant such as an alkylallyl sulfosuccinate, etc. The composition is applied to various synthetic resin molding products preferably in 3-15 μm thickness and irradiated with an active energy such as ultraviolet light so that a coating film having excellent wear resistance and fogging resistance can be formed.


Inventors:
HATA KAZUYUKI
KUSAKA HIROSHI
HOSOKAWA NORITAKA
HAYAMA KAZUHIDE
Application Number:
JP22607998A
Publication Date:
February 22, 2000
Filing Date:
August 10, 1998
Export Citation:
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Assignee:
MITSUBISHI CHEM CORP
International Classes:
C09K3/10; C08F299/00; C09D4/02; C09D5/00; (IPC1-7): C08F299/00; C09D4/02; C09D5/00; C09K3/10
Attorney, Agent or Firm:
Atsushi Kamata (2 outside)