Title:
ADAMANTANE-BASED POLYMER AND PHOTORESIST COMPOSITION BY USING THE SAME
Document Type and Number:
Japanese Patent JP2004176026
Kind Code:
A
Abstract:
To provide an adamantane-based polymer having a high dry etching resistance and an excellent penetrating property to a lower wave length light, and especially suitable for a film-forming composition of a photoresist-forming component used for an ArF excimer laser light or a F2 excimer laser light, and a photoresist composition by using the same.
This adamantane-based polymer obtained by polymerizing adamantane esters and ortho-ketals having a specific structure or polymerizing them with another monomer, and the photoresist composition containing the adamantane-based polymer as a film-forming component and also a compound producing an acid by the irradiation of a radiation are provided.
Inventors:
HATAKEYAMA NAOYOSHI
TANAKA SHINJI
ONO HIDETOSHI
TANAKA SHINJI
ONO HIDETOSHI
Application Number:
JP2002370756A
Publication Date:
June 24, 2004
Filing Date:
December 20, 2002
Export Citation:
Assignee:
IDEMITSU PETROCHEMICAL CO
International Classes:
G03F7/039; C08F16/14; C08F26/02; C08F28/04; C08F30/04; C08F32/04; H01L21/027; (IPC1-7): C08F16/14; C08F26/02; C08F28/04; C08F30/04; C08F32/04; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Tamotsu Otani
Masamichi Tohei
Masamichi Tohei
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