Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ADHERING STRUCTURE FOR METAL MASK
Document Type and Number:
Japanese Patent JPH0745662
Kind Code:
A
Abstract:

PURPOSE: To reduce the thickness of a metal mask and, at the same time, to improve the adhesive property of the mask by closely sticking the mask to a substrate by means of a magnetizing member provided on the rear surface of the substrate.

CONSTITUTION: When the switch of an electromagnet 3 is turned on after aligning a metal mask 2, the mask 2 is closely stuck to a semiconductor wafer 1. The wafer 1, mask 2, and electromagnet 3 fixed on a fixing member 4 are put in a BLM film forming device and CCB bumps are formed on the wafer 1. Since the mask 2 is formed of such a ferromagnetic material as the 42-alloy, the mask is closely stuck to the substrate 1 by utilizing the magnetic force of the electromagnet 3. Therefore, the mask 2 does not bloat, but closely adhere to the wafer 1. In addition, since the mask 2 can be formed in a desired thickness, the surface of the formed CCB bumps can be flattened and electrical inspections can be smoothly performed with probes.


Inventors:
UDA TAKAYUKI
TANAKA TAMOTSU
Application Number:
JP18947393A
Publication Date:
February 14, 1995
Filing Date:
July 30, 1993
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI LTD
International Classes:
C23C14/04; H01L21/321; H01L21/60; H05K3/14; (IPC1-7): H01L21/60; C23C14/04; H01L21/321
Attorney, Agent or Firm:
Yamato Tsutsui