Title:
ADHESIVE FOR PELLICLE, PELLICLE FRAME WITH ADHESIVE LAYER, PELLICLE, EXPOSURE ORIGINAL PLATE WITH PELLICLE, EXPOSURE METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY BOARD
Document Type and Number:
Japanese Patent JP2022064462
Kind Code:
A
Abstract:
To provide an adhesive for pellicle that can reduce the residue sticking to an exposure original plate when the pellicle is peeled off from the exposure original plate after exposure, especially after exposure using ArF as the exposure light source, and to provide a pellicle, an exposure original plate with pellicle, an exposure original plate regeneration method, and a peeling residue reduction method.SOLUTION: Provided is an adhesive for pellicle, which is an adhesive 13 for pellicle for adhering a pellicle 10 to an exposure original plate 1, and in which a (meth)acrylic acid alkyl ester in which the number of carbon atoms of the alkyl group is 4 or less, and an acrylic polymer in which a (meth)acrylic acid ester having an ether bond is the monomer component are used as a base material.SELECTED DRAWING: None
Inventors:
HAMADA YUICHI
NISHIMURA AKINORI
NISHIMURA AKINORI
Application Number:
JP2020173103A
Publication Date:
April 26, 2022
Filing Date:
October 14, 2020
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F1/62; C09J133/02; C09J133/06; C09J133/14
Attorney, Agent or Firm:
Eiichiro Shimazaki