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Title:
ADHESIVE FOR SEALING SEMICONDUCTOR AND PRODUCTION METHOD THEREFOR, AND SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2012236883
Kind Code:
A
Abstract:

To provide: an adhesive for sealing a semiconductor with which generation of voids is sufficiently controlled even in high temperature connection, and flux activity of a flux agent is obtained effectively; a production method therefor; and a semiconductor device produced by using the adhesive for sealing the semiconductor.

This adhesive for sealing the semiconductor is obtained by removing at least a part of organic solvent from an adhesive varnish containing (a) an epoxy resin, (b) an epoxy resin-curing agent, (c) a flux agent and (d) an organic solvent, so as to satisfy the following formulae (I) and (II). The formula (I) is [(reaction initiation temperature of adhesive for sealing semiconductor)≥(boiling point of (d) organic solvent)]. The formula (II) is [0.5≤(content (mass%) of (d) organic solvent in adhesive for sealing semiconductor)≤1.5].


Inventors:
HONDA KAZUTAKA
NAGAI AKIRA
ENOMOTO TETSUYA
Application Number:
JP2011105537A
Publication Date:
December 06, 2012
Filing Date:
May 10, 2011
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
C09J163/00; C08G59/18; C09J7/00; C09J11/06; C09J179/08; H01L21/60; H01L23/29; H01L23/31
Domestic Patent References:
JP2009256587A2009-11-05
JP2006245242A2006-09-14
JP2011026374A2011-02-10
JP2001223227A2001-08-17
JP2008172275A2008-07-24
Foreign References:
WO2008054011A12008-05-08
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshinori Shimizu
Hiroyuki Hirano