Title:
電子ビームの調整
Document Type and Number:
Japanese Patent JP5860091
Kind Code:
B2
Abstract:
The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.
Inventors:
Lancaster-La Roque, Simon Earl.
Chang, Colin
Uemura Kensuke
Raharjo, Purwadi
Chang, Colin
Uemura Kensuke
Raharjo, Purwadi
Application Number:
JP2014089527A
Publication Date:
February 16, 2016
Filing Date:
April 23, 2014
Export Citation:
Assignee:
Apple Inc.
International Classes:
B23K15/00; B23K20/12
Domestic Patent References:
| JP2002170511A | ||||
| JP2010100904A | ||||
| JP2006187799A | ||||
| JP2009178764A | ||||
| JP2009107011A | ||||
| JP2009018335A | ||||
| JP2006344931A |
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu