Title:
気流制御装置および気流制御方法
Document Type and Number:
Japanese Patent JP5793343
Kind Code:
B2
Abstract:
An airflow control device 1.0 in an embodiment includes: a vortex shedding structure portion 20 discharging an airflow flowing on a surface in a flow direction as a vortex flow; and a first electrode 40 and a second electrode 41 disposed on a downstream side of the vortex shedding structure portion 20 via a dielectric. By applying a voltage between the first electrode 40 and the second electrode 41, flow of the airflow on the downstream side of the vortex shedding structure portion 20 is controlled.
Inventors:
Motofumi Tanaka
Matsuda Hisashi
Yuyuki Yasui
Gohei Shohei
Naohiko Shimura
Kunihiko Wada
Ozaki Tabun
Toshiki Osako
Masahiro Asayama
Hiroshi Uchida
Matsuda Hisashi
Yuyuki Yasui
Gohei Shohei
Naohiko Shimura
Kunihiko Wada
Ozaki Tabun
Toshiki Osako
Masahiro Asayama
Hiroshi Uchida
Application Number:
JP2011109474A
Publication Date:
October 14, 2015
Filing Date:
May 16, 2011
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
B64C23/00; F15D1/12; B64C23/06
Domestic Patent References:
| JP2010119946A | ||||
| JP2010014265A | ||||
| JP2000055014A |
Foreign References:
| WO2008136697A1 | ||||
| US5334012 | ||||
| US5133519 | ||||
| DE102004038930A1 |
Attorney, Agent or Firm:
Patent Business Corporation Sakura International Patent Office