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Patent Searching and Data


Title:
ALICYCLIC COMPOUND AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JPH04159250
Kind Code:
A
Abstract:

NEW MATERIAL:The alicyclic compound of formula I [R1 is lower alkylene; R2 is lower alkylene or lower cycloalkylene which may have substituent (lower alkyl, aryl, aralkyl, halogen or CN); R3 is OH or acetoxy; n is integer of ≥1].

EXAMPLE: 2,4-Diacetoxymethylcyclohexanol.

USE: Intermediate for pharmaceuticals and agricultural chemicals, resin modifier, intermediate for urethane resin having excellent heat-resistance and weather resistance, paint capable of forming a hard and tough coating film having excellent dryability, chemical resistance and water-resistance and intermediate for plastic lens.

PREPARATION: The compound of formula I can be produced in high yield by reacting formaldehyde with a compound of formula II (R4 is lower alkenylene or lower cycloalkenylene which may have the substituent shown in the description of R2) and reacting the product with acetic anhydride, acetic acid or acetyl chloride.


Inventors:
AOKI HARUMICHI
FUJII KENICHI
KAWASAKI NOBORU
NOGUCHI YOSHIAKI
Application Number:
JP28414890A
Publication Date:
June 02, 1992
Filing Date:
October 24, 1990
Export Citation:
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Assignee:
MITSUI TOATSU CHEMICALS
International Classes:
B01J27/02; C07B61/00; C07C67/08; C07C69/18; C07C69/63; C07C253/30; C07C255/46; (IPC1-7): B01J27/02; C07B61/00; C07C67/08; C07C69/18; C07C69/63; C07C253/30; C07C255/46