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Title:
ALICYCLIC FLUORINE-CONTAINING DICARBOXYLIC ACID AND POLYMER BY USING THE SAME OR COMPOSITION FOR PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JP3847579
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a new alicyclic fluorine-containing dicarboxylic acid or its derivative, further a polymer by using the above alicyclic fluorine-containing dicarboxylic acid and an acid-instable compound for achieving a low dielectric property and high transparency, and among them, to provide a fluorine- containing polybenzoxazole as a low dielectric polymer equipped with a high heat resistance, or a fluorine-containing polyhydroxyamide as its precursor.
SOLUTION: This fluorine-containing polymer is obtained by polymerizing a fluorine-containing dicarboxylic acid expressed by the formula (1), or its amide-forming compound or ester-forming derivative.


Inventors:
Kazuhiko Maeda
Application Number:
JP2001196970A
Publication Date:
November 22, 2006
Filing Date:
June 28, 2001
Export Citation:
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Assignee:
Central Glass Co., Ltd.
International Classes:
C07C61/15; G03F7/039; C08G73/22; C08G85/00; (IPC1-7): C07C61/15; C08G73/22; C08G85/00; //G03F7/039
Domestic Patent References:
JP2001220443A
JP2000128985A
Attorney, Agent or Firm:
Yoshiaki Hanada



 
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