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Title:
ALIGNER, ADJUSTMENT METHOD, AND METHOD OF EXPOSURE
Document Type and Number:
Japanese Patent JP2000091216
Kind Code:
A
Abstract:

To provide a technique capable of positioning parts put near to an X-ray generating part by using a low-cost apparatus with respect to an aligner with an X-ray exposure light beam.

In a aligner, an X-ray light source 3 for generating an X-ray beam by making a material in a plasma state is provided. The X-ray beam from the X-ray light source 3 is used as an exposure light beam. The aligner includes light-source position observing systems 21X and 21Y for forming an image of the X-ray light source 3 when visual light is cast along with the X-ray beam from the X-ray light source 3. In the aligner in which an X-ray beam from the plasma, especially a laser-plasma X-ray beam, is used as a light source, the position of the part is reproduced with high accuracy even when the parts around the light source is replaced.


Inventors:
KOMATSUDA HIDEKI
MORI KOJI
Application Number:
JP26279198A
Publication Date:
March 31, 2000
Filing Date:
September 17, 1998
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027; G02B17/00; G03F7/20; (IPC1-7): H01L21/027; G02B17/00; G03F7/20
Attorney, Agent or Firm:
Katsuhiko Inokuma