To provide a projector for photographing a pattern of a mask on a substrate, which includes a radiation-sensitive layer, using a projection charged particle beam.

A mask 31 includes a membrane layer 37 made of a first material, scattering regions 39 made of a second material which forms a pattern and scatters charged particles more strongly than the membrane layer 37, and a plurality of linear support column groups 37, which are arranged at intervals and support the membrane layer 37 together with the scattering regions 39. The projector includes a beam-forming device 45 for generating a projection beam 41 having a prescribed projection beam cross section in a mask surface, and positioning devices 57 and 55 for moving the projection beam cross section along a prescribed path on the mask 31, in parallel with an extending direction of the column groups 33 in the mask surface. The projector includes a sensor 65 for supplying a different measurement signal 69, depending upon the number of charged particles emitted to mark regions 61 formed on the mask 31.