Title:
ALIGNER AND EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2005032813
Kind Code:
A
Abstract:
To provide an aligner and an exposure method which can reduce time duration necessary for exposure treatment by attaining improvement of efficiency of treatment in a control system, so that a device can be manufactured by a high throughput as a result.
After a high rank controller performs analysis/preparation treatment of sequence C1, and while a low rank controller performs low rank execution operation of the sequence C1 based on the information obtained by the treatment of the high rank controller, it performs analysis/preparation treatment of sequence C2.
Inventors:
TSUJIUCHI KISHIYO
MURATA MINORU
MURATA MINORU
Application Number:
JP2003193573A
Publication Date:
February 03, 2005
Filing Date:
July 08, 2003
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Masakazu Aoyama
Kazuya Nishi
Tadashi Takahashi
Masakazu Aoyama
Kazuya Nishi