To provide a stationary exposure system, capable of improving a throughput while maintaining exposure accuracy by performing capability of a scanning exposure system, when mix-and-match operation is conducted with the scanning exposure system.

The scanning projection aligner comprises a projection optical system PL having an image field, capable of being simultaneously exposed at one shot of the scanning projection aligner. Thus, a one-in-one exposure, having a maximum exposure possible range of the scanning exposure system as a shot region can be performed. A main controller 28 changes a control factor of the system 100 contributing to the throughput, in response to a minimum line width of the pattern. The factor is changed so that a state in which the throughput is regarded most important (or value) is obtained, only in the case that a decrease in the exposure accuracy is allowed. Thus, the throughput can be improved, while maintaining the exposure accuracy, as compared with the case that the exposure system is always controlled based on the same value.