To provide a high-performance aligner system which can sufficiently meet strict illumination conditions and a method by which a superior microdevice can be manufacture through exposure of a finer pattern.

This exposure system is provided with a projection system, which projects the pattern formed on a mask upon a photosensitive substrate, an illumination optical system which forms an irradiated area at a position on the mask, and a moving means which moves the mask and substrate relative to the projection system along a prescribed scan-exposure direction. This system is also provided with first and second illumination adjusting means, which respectively adjust the illumination characteristics along the scan-exposure direction and another direction crossing the scan-exposure direction, a first telecentricity adjusting means which gives an inclined component to telecentricity, and a second telecentricty adjusting means which adjusts the telecentricty correspondingly to a position from the optical axis.