To provide an aligner capable of preventing the generation of a non-operating time in a measuring station and improving exposure accuracy.

The aligner 100 is provided with the measuring station 110 measuring alignment and a focus in a substrate P, an exposure station 120 scanning and exposing respective shot regions of the substrate P which are measured by the measuring station 110, and a main control part 141 controlling an exposure operation in the exposure station 120 based on a measured result in the measuring station 110. The main control part 141 determines a scanning speed of the substrate P in exposure in the exposure station 120 for the respective shot regions based on the focus measurement result in the measuring station 110, obtains a time required for the exposure of the substrate P in the exposure station 120 based on the scanning speed determined for each shot region and determines the number of the shot regions to be measured in the measuring station 110 in accordance with the obtained time.