Title:
ALIGNING METHOD, EXPOSURE DEVICE AND X-RAY EXPOSING MASK
Document Type and Number:
Japanese Patent JP3127718
Kind Code:
B2
Abstract:
PURPOSE: To improve aligning accuracy by aligning a wafer with a mask by correcting the results of alignment based on previously registered offset data.
CONSTITUTION: Heterodyne position detecting method is used for a position detecting optical system 105 provided with a single-color light source. Single- color beams 106 are applied on a position detecting diffraction grating provided on a mask 101 and a wafer 102 from the ± primary direction. Signal detection of the optical system 105 is performed by using a standard mark 103 before alignment, and the results are registered to a position detection control means 109. In addition to the relative position detection results of the mask 101 and the wafer 102, the standard mark 103 is used and a correcting value registered to the position detection control means 109 is taken into account for the actual position detection. Thus, offset errors due to the errors of the position detecting optical system 105 are automatically corrected by the measurement results.
Inventors:
Keisuke Koga
Juro Yasui
Juro Yasui
Application Number:
JP13898994A
Publication Date:
January 29, 2001
Filing Date:
June 21, 1994
Export Citation:
Assignee:
Matsushita Electric Industrial Co., Ltd
International Classes:
G03F1/22; G03F7/20; G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G03F1/16; G03F7/20; G03F9/00
Domestic Patent References:
| JP3272406A | ||||
| JP7174517A | ||||
| JP590126A | ||||
| JP587529A | ||||
| JP5241324A | ||||
| JP792656A | ||||
| JP385717A | ||||
| JP3105911A | ||||
| JP5655041A | ||||
| JP562880A | ||||
| JP2293748A |
Attorney, Agent or Firm:
Fumio Iwahashi (2 others)