Title:
ALIGNMENT DEVICE
Document Type and Number:
Japanese Patent JPS61131442
Kind Code:
A
Abstract:
PURPOSE:To enable to obtain an extremely high mathcing precision by a method wherein whether to make a wafer shift to the reticle side or to the wafer side is discriminated according to the metered result of the deviation amount between the reticle and the wafer. CONSTITUTION:The deviation amounts between a reticle reference mark RKR (L) on a lens PQ and the reticle set mark RSR (L) of a reticle RT in the left and right X and Y directions are detected by a detector 18R (1). Whether or not the even value of each metered value of these deviation amounts is within the allowable value is discriminated and when the even value does not still reach within the allowable value, each pulse motor PX and PY of a reticle stage RS and the lens PQ are again made to drive and the reticle stage RS is made to shift until the even value does reach within the allowable value. When the CPU discriminates that the even value reached within the allowable value, the exposing region of the reticle RT is set and the opening region of a blade BL is set so that a central circuit pattern part CP and left and right scribing regions SCR (L) are made to expose.
Inventors:
AYADA NAOKI
YAMAMURA MITSUGI
HAMAZAKI FUMIYOSHI
KOSUGI MASAO
TAKAHASHI KAZUO
SEKI MITSUAKI
YAMAMURA MITSUGI
HAMAZAKI FUMIYOSHI
KOSUGI MASAO
TAKAHASHI KAZUO
SEKI MITSUAKI
Application Number:
JP25192784A
Publication Date:
June 19, 1986
Filing Date:
November 30, 1984
Export Citation:
Assignee:
CANON KK
International Classes:
H01L21/30; G03F7/20; G03F9/00; H01L21/027; (IPC1-7): G03F9/00
Attorney, Agent or Firm:
Tatsuo Ito